Key Features: Self Centering to fit 5" backing plate Designed to use with DA polisher & rotary polisher Cool Running: Runs 10% cooler on long throw dual action polisher than comparable pads Engineered bevel angle prevents pad " rolling", allowing pad to stay flat on surface Dual density foam design maintains optimum surface contact eliminating a "concaving effect" which extends use on long-throw dual action polisher
Perfectly balanced pad for optimum control; Increased stability from dual density design allows improved control on curved panels; Less foam movement minimizes haze and micro marring; Pad design allows for quick cleaning and drying
Key Features: Self Centering to fit 5" backing plate Designed to use with DA polisher & rotary polisher Cool Running: Runs 10% cooler on long throw dual action polisher than comparable pads Engineered bevel angle prevents pad " rolling", allowing pad to stay flat on surface Dual density foam design maintains optimum surface contact eliminating a "concaving effect" which extends use on long-throw dual action polisher
Perfectly balanced pad for optimum control; Increased stability from dual density design allows improved control on curved panels; Less foam movement minimizes haze and micro marring; Pad design allows for quick cleaning and drying
Key Features: Self Centering to fit 6" backing plate Designed to use with DA polisher & rotary polisher Cool Running: Runs 10% cooler on long throw dual action polisher than comparable pads Engineered bevel angle prevents pad " rolling", allowing pad to stay flat on surface Dual density foam design maintains optimum surface contact eliminating a "concaving effect" which extends use on long-throw dual action polisher
Perfectly balanced pad for optimum control; Increased stability from dual density design allows improved control on curved panels; Less foam movement minimizes haze and micro marring; Pad design allows for quick cleaning and drying
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